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Vol. 34, No. 8(3), S&M3042

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Vol. 32, No. 8(2), S&M2292

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Sensors and Materials
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Sensors and Materials, Volume 36, Number 1(2) (2024)
Copyright(C) MYU K.K.
pp. 149-154
S&M3504 Research Paper of Special Issue
https://doi.org/10.18494/SAM4629
Published: January 26, 2024

Comparison Between Neutron Bragg Dip and Electron Backscatter Diffraction Images of TlBr Semiconductors [PDF]

Kenichi Watanabe, Yusuke Sugai, Sota Hasegawa, Keitaro Hitomi, Mitsuhiro Nogami, Takenao Shinohara, Yuhua Su, Joseph Don Parker, and Winfried Kockelmann

(Received September 23, 2023; Accepted December 5, 2023)

Keywords: TlBr semiconductor detector, neutron diffraction, energy-resolved neutron imaging, electron backscatter diffraction

Thallium bromide (TlBr) semiconductor detectors are promising candidates for high-detection-efficiency, high-energy-resolution, and room-temperature gamma-ray spectrometers. In this study, we conducted neutron Bragg dip and electron backscatter diffraction (EBSD) imaging of TlBr crystals to measure the crystal orientation distribution. We confirmed that crystal grains were continuous over a certain distance along the solidification direction for samples fabricated with the current growth procedure. Finally, we compared the crystal orientation maps obtained with the two techniques. The two types of maps showed similar patterns. We concluded that EBSD, which can observe only surfaces, can be utilized to assess the uniformity of the bulky TlBr crystal, especially when observing the crystal surface perpendicular to the solidification direction.

Corresponding author: Kenichi Watanabe


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Cite this article
Kenichi Watanabe, Yusuke Sugai, Sota Hasegawa, Keitaro Hitomi, Mitsuhiro Nogami, Takenao Shinohara, Yuhua Su, Joseph Don Parker, and Winfried Kockelmann, Comparison Between Neutron Bragg Dip and Electron Backscatter Diffraction Images of TlBr Semiconductors, Sens. Mater., Vol. 36, No. 1, 2024, p. 149-154.



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