pp. 445-454
S&M258 Research Paper Published: 1996 Rapid Thermal Annealing of Doped Silicon Films to Relax Intrinsic Stress [PDF] Thomas Scheiter, Markus Biebl, Christofer Hierold and Helmut Klose Cite this article Thomas Scheiter, Markus Biebl, Christofer Hierold and Helmut Klose, Rapid Thermal Annealing of Doped Silicon Films to Relax Intrinsic Stress, Sens. Mater., Vol. 8, No. 7, 1996, p. 445-454. |