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Notice of retraction
Vol. 34, No. 8(3), S&M3042

Notice of retraction
Vol. 32, No. 8(2), S&M2292

Print: ISSN 0914-4935
Online: ISSN 2435-0869
Sensors and Materials
is an international peer-reviewed open access journal to provide a forum for researchers working in multidisciplinary fields of sensing technology.
Sensors and Materials
is covered by Science Citation Index Expanded (Clarivate Analytics), Scopus (Elsevier), and other databases.

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Sensors and Materials, Volume 32, Number 4(3) (2020)
Copyright(C) MYU K.K.
pp. 1567-1576
S&M2202 Research Paper
https://doi.org/10.18494/SAM.2020.2732
Published: April 30, 2020

Waveguide-mode Sensor Chip with Si/SiO2/SiOx Structure [PDF]

Masato Yasuura, Koji Ueno, Hiroki Ashiba, Yuki Nakaya, and Makoto Fujimaki

(Received December 12, 2019; Accepted March 5, 2020)

Keywords: microcrystalline silicon, near-field light enhancement, sputtering deposition, transfer matrix method, refractive index measurement

A waveguide-mode sensor detects changes in the complex refractive index on the surface of a planar waveguide chip with high sensitivity. We developed a waveguide-mode sensor chip with the Si/SiO2 structure. It was predicted from simulations that a third layer of high refractive index added to the outermost surface of the planar waveguide may improve the sensitivity of the waveguide-mode sensor. In this research, we designed and manufactured a borosilicate glass substrate chip with a Si/SiO2/SiOx structure via sputtering deposition, and we improved the sensitivity of the waveguide-mode sensor chip. The Si/SiO2/SiOx structure chip was approximately 1.5 times more sensitive to refractive index changes than the Si/SiO2 structure chip.

Corresponding author: Masato Yasuura


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Cite this article
Masato Yasuura, Koji Ueno, Hiroki Ashiba, Yuki Nakaya, and Makoto Fujimaki, Waveguide-mode Sensor Chip with Si/SiO2/SiOx Structure, Sens. Mater., Vol. 32, No. 4, 2020, p. 1567-1576.



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