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Vol. 34, No. 8(3), S&M3042

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Vol. 32, No. 8(2), S&M2292

Print: ISSN 0914-4935
Online: ISSN 2435-0869
Sensors and Materials
is an international peer-reviewed open access journal to provide a forum for researchers working in multidisciplinary fields of sensing technology.
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Sensors and Materials, Volume 17, Number 6 (2005)
Copyright(C) MYU K.K.
pp. 317-333
S&M610 Research Paper of Special Issue
Published: 2005

Locating and Tracking the Evolution of Debonds at the Interface of Bonded Semiconductor Devices Using Infrared Photoelasticity [PDF]

Gavin Horn, Thomas J. Mackin and Jon Lesniak

(Received December 9, 2004; Accepted May 13, 2005)

Keywords: bonded silicon, defect detection, infrared photoelasticity, bond defects, wafer bonding, nondestructive evaluation

An infrared grey-field polariscope (IR-GFP) was developed as a new tool to reliably detect small defects at bonded interfaces and to distinguish between trapped interfacial defects. The IR-GFP improves upon infrared transmission (IRT) imaging by measuring the stress-fields associated with defects. The IR-GFP was validated using anodically bonded glass-silicon samples followed by imaging interface defects in fusion bonded silicon wafer pairs. Defect maps collected using the IR-GFP were contrasted with defect maps collected using conventional IRT imaging, showing that the IR-GFP has improved defect resolution. In addition, because the IR-GFP measures the defect stress field, it can distinguish between trapped gas and trapped particle defects. Furthermore, by imaging the residual stress signature associated with defects, the IR-GFP can detect defects smaller than the wavelength of the transmitted near IR (1.1 micron). Finally, utilizing the residual stress signature associated with trapped gas defects, the IR-GFP was used to track the evolution of time-dependent gas bubbles during annealing of fusion-bonded wafer pairs.

Corresponding author: Gavin Horn


Cite this article
Gavin Horn, Thomas J. Mackin and Jon Lesniak, Locating and Tracking the Evolution of Debonds at the Interface of Bonded Semiconductor Devices Using Infrared Photoelasticity, Sens. Mater., Vol. 17, No. 6, 2005, p. 317-333.



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