Sensors and Materials
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Sensors and Materials  ISSN 0914-4935

Volume 26 (2014)
Number 6

Special Issue on WUPP for III-nitrides
Guest Editor, Hideo Aida (Namiki Precision Jewel Co., Ltd./Kyushu University)


Research Reports

S&M1006
Ammonothermal Bulk GaN Growth and Its Processing
Tadao Hashimoto, Edward Letts, Daryl Key, Keith Male, Matthew Michaels and Sierra Hoff
pp. 385-392


S&M1007
Sapphre Substrate Processing for High-Performance GaN-Based Light-Emitting Diodes -Micropatterning of Sapphire Substrates and Its Effect on Light Enhancement in GaN-Based Light-Emitting Diodes-
Natsuko Aota, Hideo Aida, Yutaka Kimura and Yuki Kawamata
pp. 393-402


S&M1008
Novel Chemical Mechanical Polishing/Plasma-Chemical Vaporization Machining (CMP/P-CVM) Combined Processing of Hard-to-Process Crystals Based on Innovative Concepts
Toshiro K. Doi, Yasuhisa Sano, Syuhei Kurowaka, Hideo Aida, Osamu Ohnishi, Michio Uneda and Koki Ohyama
pp. 403-415


S&M1009
Micro-Laser-Assisted Machining: The Future of Manufacturing Ceramics and Semiconductors
Deepak Ravindra and John Patten
pp. 417-427


S&M1010
Dependence of GaN Removal Rate of Plasma Chemical Vaporization Machining on Mechanically Introduced Damage
Yasuhisa Sano, Toshiro K. Doi, Syuhei Kurokawa, Hideo Aida, Osamu Ohnishi, Michio Uneda, Kousuke Shiozawa, Yu Okada and Kazuto Yamauchi
pp. 429-434


S&M1011
Influence of Pad Surface Asperity on Removal Rate in Chemical Mechanical Polishing of Large-Diameter Silicon Wafer Applied to Substrate of GaN-Based LEDs
Michio Uneda, Yuki Maeda, Kazutaka Shibuya, Yoshio Nakamura, Daizo Ichikawa, Kiyomi Fujii and Ken-ichi Ishikawa
pp. 435-445


General Contributed Paper

S&M1012
Design and Trial Production of Microstructured ZnO Gas Sensor
Qiulin Tan, Chao Li, Wenyi Liu, Chenyang Xue, Wendong Zhang, Jun Liu, Xiaxia Ji and Jijun Xiong
pp. 447-459




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