Sensors and Materials
Contents
 
  MYU
Sensors and Materials
1-23-3-303 Sendagi, Bunkyo-ku, Tokyo 113-0022, Japan
Tel: 81-3-3821-2930
Fax: 81-3-3827-8547
 




Sensors and Materials  ISSN 0914-4935

Volume 14 (2002)
Number 5

Special Issue on New Materials for Sensors
Gurst Editor, Makoto Ishida (Toyohashi University of Technology)



Research Reports

S&M0485
Characteristics of Plasmaless Dry Etching of Silicon-Related Materials Using Chlorine Trifluoride Gas
Yoji Saito
pp. 231-237
[Abstract]


S&M0486
Silicon Dioxide Micropillars for Sieving Fabricated by Macroporous Silicon-Based Micromachining
Shinichi Izuo, Hiroshi Ohji, Patrick J. French, Kazuhiko Tsutsumi and Masafumi Kimata
pp. 239-251
[Abstract]


S&M0487
High-Sensitivity Hybrid Hall Effect ICs with Thin Film Hall Elements
Kazutoshi Ishibashi, Ichiro Okada and Ichiro Shibasaki
pp. 253-261
[Abstract]


S&M0488
Heteroepitaxial Growth of GaN on γ-Al2O3/Si Substrate by Organometallic Vapor Phase Epitaxy
Akihiro Wakahara, Nobuharu Kawamura, Hiroshi Oishi, Hiroshi Okada, Akira Yoshida and Makoto Ishida
pp. 263-270
[Abstract]

 
S&M0489
Growth-Mode Control in Sublimation Epitaxy of AlN
Tomoaki Furusho and Shigehiro Nishino
pp. 271-279
[Abstract]

 
S&M0490
Influence of Initial Layers on Crystallinity of NiO(111) Epitaxial Film Grown at Room Temperature by Pulsed Laser Deposition
Yoshiharu Kakehi, Satoru Nakao, Kazuo Satoh and Tadaoki Kusaka
pp. 281-291
[Abstract]





Copyright(C) MYU K.K. All Rights Reserved.