Sensors and Materials
Sensors and Materials
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Sensors and Materials  ISSN 0914-4935

Volume 13 (2001)
Number 6

Special Issue on Physical Chemistry of Wet Etching of Silicon (2)
Guest Editor, Henri Camon (CNRS/LAAS)

Research Reports

Realistic Step Flow Model for Orientation-Dependent Wet Etching Implemented in a Modular TCAD Environment
Anton Horn, Franz Wittmann and Gerhard Wachutka
pp. 315-323

The Structure of an Underetched Convex Mask Corner Explained as the Evolution of a Saddlepoint Vertex
Jaap van Suchtelen and Erik van Veenendaal
pp. 325-342

Monte Carlo Simulation of Wet Chemical Etching of Silicon
Erik van Veenendaal, Jaap van Suchtelen, Paul van Beurden, Herma M. Cuppen, Willem J. P. van Enckevort, A. Jasper Nijdam, Miko Elwenspoek and Elias Vlieg
pp. 343-350

Application of Dual-Doped TMAH Silicon Etchant in the Fabrication of a Micromachined Aluminum Flexing Beam Actuator
John Garra, Sebastiano Brida, Lorenza Ferrario and Makarand Paranjape
pp. 351-358

Regular Paper

Optochemical Sensor for HCl Gas Based on Tetraalkoxyphenylporphyrin Dispersed in an Acrylate Polymer Matrix
Heru Supriyatno, Katsuhiko Nakagawa and Yoshihiko Sadaoka
pp. 359-371

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