Sensors and Materials
Contents
 
  MYU
Sensors and Materials
1-23-3-303 Sendagi, Bunkyo-ku, Tokyo 113-0022, Japan
Tel: 81-3-3821-2930
Fax: 81-3-3827-8547
 




Sensors and Materials  ISSN 0914-4935

Volume 13 (2001)
Number 6

Special Issue on Physical Chemistry of Wet Etching of Silicon (2)
Guest Editor, Henri Camon (CNRS/LAAS)


Research Reports

S&M0452
Realistic Step Flow Model for Orientation-Dependent Wet Etching Implemented in a Modular TCAD Environment
Anton Horn, Franz Wittmann and Gerhard Wachutka
pp. 315-323
[Abstract]


S&M0453
The Structure of an Underetched Convex Mask Corner Explained as the Evolution of a Saddlepoint Vertex
Jaap van Suchtelen and Erik van Veenendaal
pp. 325-342
[Abstract]


S&M0454
Monte Carlo Simulation of Wet Chemical Etching of Silicon
Erik van Veenendaal, Jaap van Suchtelen, Paul van Beurden, Herma M. Cuppen, Willem J. P. van Enckevort, A. Jasper Nijdam, Miko Elwenspoek and Elias Vlieg
pp. 343-350
[Abstract]


S&M0455
Application of Dual-Doped TMAH Silicon Etchant in the Fabrication of a Micromachined Aluminum Flexing Beam Actuator
John Garra, Sebastiano Brida, Lorenza Ferrario and Makarand Paranjape
pp. 351-358
[Abstract]


Regular Paper

S&M0456
Optochemical Sensor for HCl Gas Based on Tetraalkoxyphenylporphyrin Dispersed in an Acrylate Polymer Matrix
Heru Supriyatno, Katsuhiko Nakagawa and Yoshihiko Sadaoka
pp. 359-371
[Abstract]




Copyright(C) MYU K.K. All Rights Reserved.