Sensors and Materials
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Sensors and Materials  ISSN 0914-4935

Volume 13 (2001)
Number 5

Special Issue on Physical Chemistry of Wet Etching of Silicon (1)
Guest Editor, Henri Camon (CNRS/LAAS)


Research Reports

S&M0446
Understanding the Evolution of Silicon Surface Morphology during Aqueous Etching
Melissa A. Hines
pp. 247-258
[Abstract]


S&M0447
The Preparation of Ideally Ordered Flat H-Si(111) Surfaces
Maximiliano L. Munford, Robert Cortès and Philippe Allongue
pp. 259-269
[Abstract]


S&M0448
Anisotropic Etching of Silicon in TMAH Solutions
Osamu Tabata
pp. 271-283
[Abstract]


S&M0449
Change in Orientation-Dependent Etching Properties of Single-Crystal Silicon Caused by a Surfactant Added to TMAH Solution
Kazuo Sato, Daisuke Uchikawa and Mitsuhiro Shikida
pp. 285-291
[Abstract]


S&M0450
Silicon Etch Anisotropy in Tetra-Methyl Ammonium Hydroxide: Experimental and Modeling Observations
Les M. Landsberger, Anand Pandy and Mojtaba Kahrizi
pp. 293-301
[Abstract]


S&M0451
Anisotropic Etching of Silicon on {111} and Near {111} Planes
Songsheng Tan, Robert Boudreau and Michael L. Reed
pp. 303-313
[Abstract]





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